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catalysis by inhibiting the design of dedicated plasma catalysts. This PhD position links surface science and plasma catalysis, aiming to understand the active state of a surface live during plasma exposure
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group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily
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13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the
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Interaction group focuses on developing the science and technology of new optical and optical/acoustic hybrid metrology modalities for nanolithography applications. Projects include ultra-high frequency
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Supportive supervision and guidance About the group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in